PMIC devices exposed metalization is susceptible to cleaning agent attack on the aluminum pads, exposed copper, nickle and high lead alloy. MICRONOX MX2100 intermolecular attractive forces for polar and non-polar organic acid flux residues allow for rapid dissolution of the flux residue. The low level of free alkalinity in combination with corrosion inhibition technology protect exposed metals from cleaning agent attack while still allowing post-cleaning wire bonding.
NOTE: The above process parameters are recommendations based on extensive testing done in KYZEN’s application lab. Your KYZEN sales representative can assist you in optimizing your process parameters.