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Product Function
Photo Resist as a core material is used in the lithographic process for semiconductor circuit elements manufacturing process.
In response to light, draws patterns on the wafer to form a fine circuit-pattern which is a photosensitive material for exposure process.
Stripper After completion of etching for semiconductor circuit, removes the photo resist, by-products generated in the process(Residue), non-volatile residue on surface and so on.
Photo Resist as a core material is used in the lithographic process for semiconductor circuit elements manufacturing process.
In response to light, draws patterns on the wafer to form a fine circuit-pattern which is a photosensitive material for exposure process.
Stripper After completion of etching for semiconductor circuit, removes the photo resist, by-products generated in the process(Residue), non-volatile residue on surface and so on.
Properties
- Excellent Photo Resist removing speed
- No residue after PR removal
- Excellent wetting performance while washing
- No effect deposited metal layers (Ni, Au, Ti, Al, ITO, Cr, etc.)
Range Of Products
- Available up to Nano-Level that requires a high resolution
- Usable to produce G-Byte DRAM, Flash Memory and Logic Device
- Stripping G/I-Line resist by targeting each device
- Removing various resists to materialize a minimum pattern width
Technical Data
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