• You have no product to wishlist.
  • You have no product to compare.

Product Filter

Reset All

Hyper-Blue ®

P-512 ®
Galden HS240
Galden® HS 240

out of stock
Product Function

Photo Resist as a core material is used in the lithographic process for semiconductor circuit elements manufacturing process.
In response to light, draws patterns on the wafer to form a fine circuit-pattern which is a photosensitive material for exposure process.

Stripper After completion of etching for semiconductor circuit, removes the photo resist, by-products generated in the process(Residue), non-volatile residue on surface and so on.
Manufacturer: MTI Categories: Commodity Chemicals, Surfactant



  • Excellent Photo Resist removing speed
  • No residue after PR removal
  • Excellent wetting performance while washing
  • No effect deposited metal layers (Ni, Au, Ti, Al, ITO, Cr, etc.)

Range Of Products

  • Available up to Nano-Level that requires a high resolution
  • Usable to produce G-Byte DRAM, Flash Memory and Logic Device
  • Stripping G/I-Line resist by targeting each device
  • Removing various resists to materialize a minimum pattern width


Technical Data


There are yet no reviews for this product.


Contact Us
Feel free to contact us if you have any questions
Please enter your name!
Please enter your email!
Write your message!

Request A Demo


Upload Resume
Select files...
Select files...