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Wimin ARM-710
• PC and CCD Vision system. • Programming with compensation and dust collection • Available for Max size 410-460mm • Flexible for
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METALNOX® M6319US
ALKALINE ALL PURPOSE ULTRASONIC CLEANER
METALNOX M6319US is an alkaline cleaner designed to be used in ultrasonic parts cleaning systems.
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METALNOX® M6324US
HEAVY-DUTY ALKALINE IMMERSION AND ULTRASONIC CLEANER
METALNOX M6324US is a high-strength, high alkaline aqueous cleaning chemistry
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Wimin CM-610/CM-610 Max
Combined Type Automatic Router Machine
• Upper dust collector • Magnetic thimble • Double drawer worktable • Ultra low noice
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METALNOX® M6381
PRECISION HYDROCARBON SOLVENT CLEANER
METALNOX M6381 is a hydrocarbon solvent cleaner formulated for use in continuously regenerated
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Wimin VM400
Combined Type Automatic Router Machine
• V-Cut PCB Cutting Machine
• Flexible
• Stable
• Efficient
• Precision
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METALNOX® M6386
MODIFIED ALCOHOL SOLVENT CLEANER
METALNOX M6386 is a modified alcohol-based solvent blend designed for use in automated vacuum degreasing
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Wimin-RM-288
Milling cutter full-automatic router machine
- High Efficiency - High Precision - High Flexibility
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Hyper-Pro ®
Wafer Blade Sawing Solution Surface Active Agent Products : Hyper-Pro ® Selecting the Best Material - Reduce Surface Tension(31dynes/cm) and
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AQUANOX® A4241
AQUANOX A4241 is an innovative aqueous cleaning solution developed for cleaning printed circuit boards and stencils, two (2) processes with one (1)
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Hyper-Star ®
Coating for thermal contamination
- Quality Improvement with Reduce the Temperature on Laser contact surface and Prevent Particle
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AQUANOX® A4625
AQUANOX A4625 is a highly dispersive cleaning agent designed to clean electronic assemblies in spray-in-air cleaning equipment. A4625 is effective on
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Hyper-Max ®
Professional Flux Cleaning : Flux, condensate, oil Dust and other contaminations from condensation - Bubbles occur minimum - Optimized upon
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AQUANOX® A4625B
AQUANOX A4625B was developed specifically to remove all types of solder pastes and flux residues from printed circuit board assemblies, including the
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FOBA DP 50
Advantages • Output power 50 Watt (CW) • High laser beam quality • Compact design means easy integration • No external cooling water • Long
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Hyper-Blue ®
Product Function Photo Resist as a core material is used in the lithographic process for semiconductor circuit elements manufacturing
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AQUANOX® A4638
AQUANOX A4638 is an engineered cleaning solution designed to remove flux residue from flip-chip and low clearance components on electronic assemblies
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FOBA DP 100
Advantages
• Output power 50 Watt (CW) • High laser beam quality • Compact design means easy integration • No external cooling
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P-312 ®
Cerium polishing powder Cleaning Solution : P-312 ® To follow newest trend changing to complex design, it is special purpose solution to remove
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AQUANOX® A4639
AQUANOX A4639 is an aqueous cleaning solution designed for hard to clean lead-free, rosin and no-clean flux residues in batch cleaning systems. A4639
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